Comparison ledger
Agilent 11980 A, Onto Innovation MetaPulse 200 XCu Metal Film Measurement, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 11980 AAgilent | MetaPulse 200 XCu Metal Film MeasurementOnto Innovation |
|---|---|---|
| OEM | Agilent | Onto Innovation |
| Category | Precision Optics | Precision Optics |
| Wafer size | — | Wafer Mapping |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Agilent 11980 A | Onto Innovation MetaPulse 200 |
| Specifications | ||
| Wavelength Range | 1250-1600 nm[1] | — |
| Configuration | — | Non copper tool; double path tool delay stage[2] |
| Cooling Water Required Minimum Flow | — | 0.79 GPM (3.00 l/m)[2] |
| Min Temp | — | 12 *C (54 *F, 285.00 *K)[2] |
| Max Temp | — | 20 *C (68 *F, 293 *K)[2] |
| Wafer size | — | Wafer Mapping[2] |
| Controller Type | — | PC Controller[2] |
| External Cooling | — | Water Cooled[2] |
| Cooling Water Required | — | Minimum Flow: 0.79 GPM (3.00 l/m) Min Temp: 12 *C (54 *F, 285.00 *K) Max Temp: 20 *C (68 *F, 293 *K)[2] |
| Operating Air Pressure | — | 14.00 PSI (96,534.20 N/sq m)[2] |
| Vacuum Required | — | 0.98 in Hg (24.89 mm Hg)[2] |
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