Comparison ledger
Aixtron 2600 G 3 HT MOCVD Reactor, Applied Materials 0010-13622 RF Match for, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 2600 G 3 HT MOCVD ReactorAixtron | 0010-13622 RF Match forApplied Materials |
|---|---|---|
| OEM | Aixtron | Applied Materials |
| Category | Deposition | Deposition |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Aixtron AIX 2600 | Applied Materials 0010-13622 RF Match for |
| Specifications | ||
| Software Version | CACE 3.5.0286[1] | — |
| PLC | 3.7[1] | — |
| SLC | 2.01[1] | — |
| Process | AllnGaP MOCVD Epitaxy[1] | — |
| Wafer | 7 x 6"[1] | — |
| Metal Organic Sources | TMIn x 3, TMGa x 2, TMAI x 1, Cp2Mg x 1, DIPTe x 1, CBr4 x 1[1] | — |
| Hydride Sources | PH 3 x 1, AsH3 x 1, 100 ppm SiH4 in Ar x 1[1] | — |
| Concentration Monitors | Episons 5 x 3 for TMIn[1] | — |
| Configuration | Chiller Baths[1] | High Efficiency HE RF Match-Bias[3] |
| Purifiers | Entegris Getter for H2 & N2[1] | — |
| Filters | Entegris Filtersfor AsH3 & Ph3[1] | — |
| Heating System | RF Coil with Trumpf Huttinger RF Generator BIG 120/50[1] | — |
| Glove Box | MBraun Nitrogen Glovebox with Controller[1] | — |
| Process Pump | Kashiyama SDE 300[1] | — |
| DOR & Glove Box Pumps | Adixen ACP - 15G x 2[1] | — |
| Reactor Chiller | Affinity Recirculating Closed Loop Chiller[1] | — |
| Software | CACE 3.5.0284[2] | — |
| Gas Foil Rotation (GFR) | Active[1] | — |
| Model | — | 0010-13622[3] |
| Product Type | — | RF Match for PVD (Physical Vapor Deposition)[3] |
| Feature | — | High Efficiency HE RF Match-Bias[3] |
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