Waferpedia

Comparison ledger

G 5 WW C SiC Epitaxy Reactorversus0020 18698 Part

Aixtron G 5 WW C SiC Epitaxy Reactor, Applied Materials 0020 18698 Part, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0020 18698 PartApplied Materials
OEMAixtronApplied Materials
CategoryDepositionDeposition
Wafer sizeWafer transfer module—
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyAixtron G 5 WW C SiC Epitaxy ReactorApplied Materials 0020 18698 Part
Specifications
Phase3 Phase[1]—
Configuration4 Wire + Ground[1]Dial Cover, Side Local Match, Hdpcvd, Ul[2]
Voltage208V / 120V AC[1]—
Frequency60 Hz[1]—
Wafer sizeWafer transfer module[1]—

Plan your fab

Building a Deposition process? Get a complete equipment list.

Open the fab equipment planner →
Sources (2)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]inventory listing