Comparison ledger
Applied Materials 0010-03254 E Chuck, Lam Research Gasonics L 3510 Asher / Stripper, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-03254 E ChuckApplied Materials | Gasonics L 3510 Asher / StripperLam Research |
|---|---|---|
| OEM | Applied Materials | Lam Research |
| Category | — | — |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | — | Lam Research Gasonics L 3510 Asher / Stripper |
| Specifications | ||
| Microwave Power | — | 0–1200 W at 2.45 GHz[1] |
| Pressure Range | — | 0.5 to >5.0 torr[1] |
| Platen Temperature | — | 100–300°C[1] |
| Ash Rate | — | Up to 3.5 µm/min[1] |
| Throughput | — | 45–60 WPH[1] |
| Within Wafer Uniformity | — | ±5% to 10%[1] |
| Wafer-to-Wafer Uniformity | — | ±5% to 10%[1] |
| Process Gas | — | O2, N2[1] |
| Wafer Size Support | — | 75 mm to 200 mm (3 to 8 inch)[2] |
| Process Type | — | Downstream microwave plasma ashing[2] |
| Endpint Detection | — | Yes, typical[2] |
| Heating | — | Platen and lampe heating[1] |