Waferpedia

Comparison ledger

0010-03485 Magnet AssyversusACU 200

Applied Materials 0010-03485 Magnet Assy, Axcelis ACU 200, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0010-03485 Magnet AssyApplied Materials
ACU 200Axcelis
OEMApplied MaterialsAxcelis
Category——
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0010-03485 Magnet AssyAxcelis ACU 200
Specifications
ConfigurationWP AL 300mm PVD[1]—
OEMApplied Materials[1]—
Model0010-03485[1]ACU 200[5]
DescriptionMAGNET ASSY, WP AL 300MM PVD[2]Microwave asher[6]
ProcessPVD[3]—
Wafer size300mm[4]200 mm[6]
VersionSpares[4]—
Part Number0010-03485[1]—
ManufacturerApplied Materials[1]Axcelis[5]
Process TypePVD (Physical Vapor Deposition)[1]—
Application (Material)Aluminum (AL)[1]—
Wafer Diameter (associated)300 mm[1]—
Equipment type—Asher[5]
Chambers—Single chamber[6]
Included component—Microwave generator[6]
Sources (6)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]semistarcorp.comsemistarcorp.com
  3. [3]layla-ec.comlayla-ec.com
  4. [4]fabsurplus.comfabsurplus.com
  5. [5]Equipment inventory listing
  6. [6]auction.fabexchange.comauction.fabexchange.com