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Comparison ledger

0010-03485 Magnet AssyversusRV3

Applied Materials 0010-03485 Magnet Assy, Edwards RV3, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0010-03485 Magnet AssyApplied Materials
RV3Edwards
OEMApplied MaterialsEdwards
Category——
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0010-03485 Magnet AssyEdwards RV3
Specifications
ConfigurationWP AL 300mm PVD[1]Two-stage rotary vane[5]
OEMApplied Materials[1]—
Model0010-03485[1]RV3[5]
DescriptionMAGNET ASSY, WP AL 300MM PVD[2]—
ProcessPVD[3]—
Wafer size300mm[4]—
VersionSpares[4]—
Part Number0010-03485[1]—
ManufacturerApplied Materials[1]—
Process TypePVD (Physical Vapor Deposition)[1]—
Application (Material)Aluminum (AL)[1]—
Wafer Diameter (associated)300 mm[1]—
Pump type—Standard two-stage rotary vane pump[5]
Design—Proven design[5]
Operating character—Quiet running and vibration free[5]
Gas ballast—Fitted with a gas ballast valve[5]
Included items—Electrical mains cable and on/off switch[5]
Drive Type—Direct drive[5]
Gas Ballast Valve—Yes[5]
Features—Gas ballast valve, quiet running, vibration free[5]
Sources (5)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]semistarcorp.comsemistarcorp.com
  3. [3]layla-ec.comlayla-ec.com
  4. [4]fabsurplus.comfabsurplus.com
  5. [5]web.archive.orgweb.archive.org