Comparison ledger
Applied Materials 0010-03485 Magnet Assy, KLA UV 1050 Film Thickness, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-03485 Magnet AssyApplied Materials | |
|---|---|---|
| OEM | Applied Materials | KLA |
| Category | — | — |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-03485 Magnet Assy | KLA UV 1050 Film Thickness |
| Specifications | ||
| Configuration | WP AL 300mm PVD[1] | — |
| OEM | Applied Materials[1] | — |
| Model | 0010-03485[1] | — |
| Description | MAGNET ASSY, WP AL 300MM PVD[2] | — |
| Process | PVD[3] | — |
| Wafer size | 300mm[4] | — |
| Version | Spares[4] | — |
| Part Number | 0010-03485[1] | — |
| Manufacturer | Applied Materials[1] | — |
| Process Type | PVD (Physical Vapor Deposition)[1] | — |
| Application (Material) | Aluminum (AL)[1] | — |
| Wafer Diameter (associated) | 300 mm[1] | — |
| Optics type | — | Broadband UV[5] |
| Measurement technique | — | Dual beam spectrophotometry[5] |
| Light source | — | Broadband Xenon Arc Lamp[5] |
| Stage resolution (xy) | — | 0.25 µm[6] |
| Stage resolution (z) | — | 0.025 µm[6] |
| Wafer sizes | — | 100 mm, 125 mm, 150 mm, 200 mm[7] |
| Number of discrete wavelengths | — | over 500[5] |
| Imaging system | — | Color camera[5] |
| Focus | — | Automatic focus on measurement site[5] |
| Operating system | — | Windows NT[5] |
| Software | — | Summit Software with GUI[5] |