Comparison ledger
Applied Materials 0010-03485 Magnet Assy, SUSS MicroTec AS 8, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-03485 Magnet AssyApplied Materials | AS 8SUSS MicroTec |
|---|---|---|
| OEM | Applied Materials | SUSS MicroTec |
| Category | — | — |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-03485 Magnet Assy | SUSS MicroTec AS 8 |
| Specifications | ||
| Configuration | WP AL 300mm PVD[1] | — |
| OEM | Applied Materials[1] | — |
| Model | 0010-03485[1] | — |
| Description | MAGNET ASSY, WP AL 300MM PVD[2] | — |
| Process | PVD[3] | — |
| Wafer size | 300mm[4] | — |
| Version | Spares[4] | — |
| Part Number | 0010-03485[1] | — |
| Manufacturer | Applied Materials[1] | — |
| Process Type | PVD (Physical Vapor Deposition)[1] | — |
| Application (Material) | Aluminum (AL)[1] | — |
| Wafer Diameter (associated) | 300 mm[1] | — |
| Substrate size (round) | — | up to 200 mm[5] |
| Substrate size (square) | — | up to 6" edge length[5] |
| Dual-nozzle substrate sizes | — | Ø150 mm, Ø200 mm[5] |
| Single-nozzle substrate sizes | — | Ø3", Ø100 mm, Ø150 mm, Ø200 mm[5] |
| Z-axis adjustment range | — | up to 45 mm[5] |
| Nozzle adjustment range | — | 67.5 mm to 107.5 mm[5] |
| Spray axis maximum velocity | — | 500 mm/s[5] |
| Spray axis acceleration | — | up to 9 m/s²[5] |
| Chuck maximum rotation speed | — | 1,000 rpm[5] |
| Heated chuck | — | optional[5] |
| Splash-ring design | — | included[5] |