Waferpedia

Comparison ledger

0010-03485 Magnet Assyversus4-point

Applied Materials 0010-03485 Magnet Assy, Veeco 4-point, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0010-03485 Magnet AssyApplied Materials
4-pointVeeco
OEMApplied MaterialsVeeco
Category——
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0010-03485 Magnet AssyVeeco 4-point
Specifications
ConfigurationWP AL 300mm PVD[1]—
OEMApplied Materials[1]—
Model0010-03485[1]—
DescriptionMAGNET ASSY, WP AL 300MM PVD[2]—
ProcessPVD[3]—
Wafer size300mm[4]—
VersionSpares[4]—
Part Number0010-03485[1]—
ManufacturerApplied Materials[1]—
Process TypePVD (Physical Vapor Deposition)[1]—
Application (Material)Aluminum (AL)[1]—
Wafer Diameter (associated)300 mm[1]—
Listed in metrology suite—Veeco 4-point probe[5]
Maximum substrate size—6 inch[6]
Measurement capabilities—Sheet resistance, slice resistivity, V/I, metallization thickness, P‑N type testing[7]
Probe mechanism—Wafer is moved into the probe head, not vice versa[7]
Measurement Capabilities—Sheet resistivity, slice resistivity, metallization thickness, P-N type testing[7]
Sources (7)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]semistarcorp.comsemistarcorp.com
  3. [3]layla-ec.comlayla-ec.com
  4. [4]fabsurplus.comfabsurplus.com
  5. [5]cores.research.asu.educores.research.asu.edu
  6. [6]nnci.netnnci.net
  7. [7]nrf.aux.eng.ufl.edunrf.aux.eng.ufl.edu