Comparison ledger
Applied Materials 0010-03485 Magnet Assy, Zeiss NVision 40, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-03485 Magnet AssyApplied Materials | NVision 40Zeiss |
|---|---|---|
| OEM | Applied Materials | Zeiss |
| Category | — | — |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-03485 Magnet Assy | Zeiss NVision 40 |
| Specifications | ||
| Configuration | WP AL 300mm PVD[1] | 208-230 V[5] |
| OEM | Applied Materials[1] | — |
| Model | 0010-03485[1] | NVision 40[5] |
| Description | MAGNET ASSY, WP AL 300MM PVD[2] | — |
| Process | PVD[3] | — |
| Wafer size | 300mm[4] | — |
| Version | Spares[4] | — |
| Part Number | 0010-03485[1] | — |
| Manufacturer | Applied Materials[1] | Zeiss[5] |
| Process Type | PVD (Physical Vapor Deposition)[1] | — |
| Application (Material) | Aluminum (AL)[1] | — |
| Wafer Diameter (associated) | 300 mm[1] | — |
| Electron microscope type | — | SEM-FIB[6] |
| SEM column | — | Schottky field emission Gemini column[7] |
| SEM operating voltage | — | 100 V to 30 kV[7] |
| SEM resolution | — | 1.1 nm at 20 kV; 2.5 nm at 1 kV[7] |
| FIB column | — | SIINT Zeta Ga+ ion FIB column[7] |
| FIB operating voltage | — | 1 kV to 30 kV[7] |
| FIB ion current | — | 0.1 pA to 45 nA[7] |
| Ion beam resolution | — | 4 nm at 1 pA[7] |
| Power | — | 208-230 V[5] |
| Frequency | — | 50-60 Hz[5] |
| Gas delivery | — | Has W, C SiO2 and H20 gases installed[8] |
| Micromanipulator | — | With kleindiek mm3a micromanipulator[5] |
| XeF2 | — | Option, not installed[5] |
| Controller status | — | One of the controllers on the two turbo pumps is not operational[8] |
| Detectors | — | Everhart-Thornley detector, 4 quadrant backscatter, in-lens secondary electron detector, energy selective backscatter detector[7] |
| Lithography system | — | Raith Elphy Quantum lithography system[7] |
| Nanoscale lithography | — | NanoPattern Generating System (NPGS)[9] |