Waferpedia

Comparison ledger

0010-13627 High Efficiency RF Matchversus610 PB 26 NM 0002 903 Part

Applied Materials 0010-13627 High Efficiency RF Match, VAT 610 PB 26 NM 0002 903 Part, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
OEMApplied MaterialsVAT
CategoryLab & Support EquipmentLab & Support Equipment
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0010-13627 High Efficiency RF MatchVAT 610 PB 26 NM 0002 903 Part
Specifications
ConfigurationHE, BIAS[1]Adaptive Pressure Controller[2]
Asset Number70430[1]—
TypeHigh Efficiency RF Match - HE, BIAS[1]—

Plan your fab

Building a Lab & Support Equipment process? Get a complete equipment list.

Open the fab equipment planner →
Sources (2)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]inventory listing