Comparison ledger
Applied Materials 0010-14300 Magnet Assy, Applied Materials xR Leap Ion, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-14300 Magnet AssyApplied Materials | xR Leap IonApplied Materials |
|---|---|---|
| OEM | Applied Materials | Applied Materials |
| Category | Ion Implantation | Ion Implantation |
| Wafer size | — | Si Wafer |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-14300 Magnet Assy | Applied Materials xR Leap Ion |
| Specifications | ||
| Configuration | P4 Magnet Assy, IMP[1] | — |
| Gearbox P/N | 0010-27417[1] | — |
| Part Number | 0010-14300[1] | — |
| Description | P4 Magnet Assy, IMP[1] | — |
| Voltage | — | 205 Vac[2] |
| Frequency | — | 60 Hz, 3 Phase, 5 Wire[2] |
| Wafer size | — | Si Wafer[2] |
| Gases used | — | N2, Argon, BF3-cylinder, AsH3(SDS), PH3 (SDS), GeF4-cylinder- All inside an internal gas box[2] |
| Wafer Size | — | 8 inch[2] |
| Power Requirements | — | 205 Vac, 60 Hz, 3 Phase, 5 Wire[2] |
| Wafer Wheel Capacity | — | 17 wafer[2] |
| Energy Range | — | Ultra low energy range (300 eV)[2] |
| Number of Vaporizer Sources | — | 2[2] |
| Plasma Flood Gun | — | Yes[2] |
| Gases Used | — | N2, Argon, BF3 (cylinder), AsH3 (SDS), PH3 (SDS), GeF4 (cylinder)[2] |
| Gas Box | — | Internal gas box[2] |
| Automation Software | — | Advanced Automation Software[2] |
| Spare Parts Included | — | Yes[2] |
| Substrate Material | — | Si Wafer[2] |
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