Comparison ledger
Applied Materials 0010-22161 High EFF RF Match, ASML PAS 5500 60, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-22161 High EFF RF MatchApplied Materials | PAS 5500 60ASML |
|---|---|---|
| OEM | Applied Materials | ASML |
| Category | — | — |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-22161 High EFF RF Match | ASML PAS 5500 |
| Specifications | ||
| Make | Applied Materials[1] | — |
| Model | 0010-22161[1] | — |
| Description | HTESC PH 1 REV A[2] | — |
| Condition | Used[2] | — |
| Stock Number | BM6628[2] | — |
| Configuration | — | Parts have been swapped out[3] |
| Resolution | — | 450 nm[4] |
| Wavelength | — | 365 nm (i-line)[4] |
| Wafer size | — | 200 mm (eight-inch)[5] |
| Throughput | — | up to 48 wafers per hour (200 mm, 55 exposures, 200 mJ/cm²)[5] |
| Design rule | — | 0.45 µm (450 nm)[5] |