Comparison ledger
Applied Materials 0010-22161 High EFF RF Match, Tokyo Electron Unity 85 DS, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-22161 High EFF RF MatchApplied Materials | Unity 85 DSTokyo Electron |
|---|---|---|
| OEM | Applied Materials | Tokyo Electron |
| Category | — | — |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-22161 High EFF RF Match | Tokyo Electron Unity |
| Cited variants | — |
|
| Specifications | ||
| Make | Applied Materials[2] | — |
| Model | 0010-22161[2] | Unity 85 DS (U 2 S 855 II)[1] |
| Description | HTESC PH 1 REV A[3] | — |
| Condition | Used[3] | — |
| Stock Number | BM6628[3] | — |
| Configuration | — | 2 chamber[1] |
| Gas | — | C4F8, O2, Ar[1] |
| OS | — | Lynx[4] |
| Manufacturer | — | Tokyo Electron[4] |
| Process | — | Oxide etch with end point[1] |
| Vacuum / pumping | — | 3ea pumps[4] |
| Gas delivery | — | C4F8, O2, Ar[4] |