Waferpedia

Comparison ledger

0020 17485 PartversusS 1861 14

Applied Materials 0020 17485 Part, Orient Service S 1861 14, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0020 17485 PartApplied Materials
S 1861 14Orient Service
OEMApplied MaterialsOrient Service
CategoryDepositionDeposition
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0020 17485 PartOrient Service S 1861 14
Specifications
ConfigurationStrap, RF Out 2 Balanced Coil Match, Hdp[1]Used with SiO2,HCL,HF,NOx,NH3,etc[2]
Technology—PECVD (Plasma-Enhanced Chemical Vapor Deposition)[2]
Process chemistry—SiO2, HCl, HF, NOx, NH3, etc.[2]
Vintage year—2015[2]

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Sources (4)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]inventory listing
  3. [3]inventory listing
  4. [4]inventory listing