Waferpedia

Comparison ledger

0020 17485 PartversusAlpha 8 S Z LPCVD

Applied Materials 0020 17485 Part, Tokyo Electron Alpha 8 S Z LPCVD, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0020 17485 PartApplied Materials
Alpha 8 S Z LPCVDTokyo Electron
OEMApplied MaterialsTokyo Electron
CategoryDepositionDeposition
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0020 17485 PartTokyo Electron Alpha
Specifications
ConfigurationStrap, RF Out 2 Balanced Coil Match, Hdp[1]—
Water Exposure—water marks inside and outside the unit[2]
Process Type—Low Pressure Chemical Vapor Deposition (LPCVD)[2]
Vintage—1996[2]

Plan your fab

Building a Deposition process? Get a complete equipment list.

Open the fab equipment planner →
Sources (2)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]inventory listing