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Comparison ledger

0020 18455 PartversusAnelva C 7100 PVD Cluster

Applied Materials 0020 18455 Part, Canon Anelva C 7100 PVD Cluster, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0020 18455 PartApplied Materials
OEMApplied MaterialsCanon
CategoryDepositionDeposition
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0020 18455 PartCanon Anelva
Specifications
ConfigurationShaft,Rf In Local Match, Hdpcvd,Rev3[1]Triple transfer chambers (loadlock/cluster 1, cluster-to-cluster, cluster 2) w/ Brooks Magna-Tran robots[2]
Wafer size—8 inch[2]
Transfer chambers—Triple transfer chambers (loadlock/cluster 1, cluster-to-cluster, cluster 2) with Brooks Magna-Tran robots[2]
Process module CH-A—CIS CH-A process module with Shimadzu TMP turbo pump[2]
Process module CH-B—Etch/OXI-EX (CH-B) process module with Inficon Transpector XPR3 RGA, Shimadzu TMP-3203LM-N1 turbo pump[2]
Process module CH-E—8PVD-EX (CH-E) process module with CTI Cryogenics PowerEco cryopump[2]
Process module CH-F—5PVD-EX (CH-F) process module with Shimadzu TMP turbo pump[2]
Process module CH-1A—8PVD-EX (CH-1A) process module with cryopump[2]
Cooling module CH-1B—Cooling (CH-1B) process module[2]
RTA module CH-1C—RTA (CH-1C) process module[2]
Process module CH-1D—4/4PVD-1D process module with Anelva P-126CL turbopump[2]
Process module CH-1F—4PVD-EX (CH-1F) process module with CTI Cryogenics PowerEco cryopump[2]

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Sources (2)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]inventory listing