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Comparison ledger

0020 18455 PartversusConcept Two Sequel

Applied Materials 0020 18455 Part, Lam Research Concept Two Sequel, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0020 18455 PartApplied Materials
Concept Two SequelLam Research
OEMApplied MaterialsLam Research
CategoryDepositionDeposition
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0020 18455 PartLam Research Concept Two
Specifications
ConfigurationShaft,Rf In Local Match, Hdpcvd,Rev3[1]Thin Film[2]
Software Version—4.92 B 15[2]
CIM—SECS[2]
Process—SRO MIM[2]
Factory Interface—SMIF (2)[2]
QNX OS Version—4.23 A[2]
Chamber Type—A (C2-CV0D-S) / B (C2-CVDD-S)[2]
SMIF—LPI 2200[2]
Input & Output Controller—IOC O, IOC2, IOC3[2]
TV Controller—Millipore[2]
Loadlock Slit Valve Actuator—SMC[2]
Loadlock Indexer Controller—Animatics CC Model CDP 2407 2[2]
Wafer Size—8 inch[2]
Chamber Type A—C2-CV0D-S[2]
Chamber Type B—C2-CVDD-S[2]
Operating System—QNX OS Version 4.23 A[2]
CIM Interface—SECS[2]
SMIF Load Port—LPI 2200[2]
Cool Station Count—4[2]
Transfer Module Robot—Mag 7[2]
Vintage Year—2000[2]
OEM—Lam / Novellus[2]
Model—Concept Two Sequel[2]

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Sources (2)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]inventory listing