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Comparison ledger

0041-26723 Bonded AssemblyversusSB 6

Applied Materials 0041-26723 Bonded Assembly, SUSS MicroTec SB 6, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
SB 6SUSS MicroTec
OEMApplied MaterialsSUSS MicroTec
CategoryPackaging & BondingPackaging & Bonding
Wafer size—Wafer bonding at pressures 5e-5 to 3e-3 Torr and 50*C to 550*C
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0041-26723 Bonded AssemblySUSS MicroTec SB 6
Cited variants—
Specifications
Configuration—Pneumatic Block replaced with a SMC Solenoid Block[3]
Wafer size—Wafer bonding at pressures 5e-5 to 3e-3 Torr and 50*C to 550*C[3]
Temperature range—50°C to 550°C[4]
Vacuum pressure—5e-5 to 3e-3 Torr[3]
Base pressure—<5x10^-5 mbar[1]
Process pressure range (source 3)—5e-5 to 3e3 mBar[4]
Maximum force—20 kN[4]
Anodic bonding voltage—up to 2000 V[4]
Temperature accuracy—+/- 5 degrees[4]
Temperature uniformity—+/- 3%[4]
Heating—Upper and lower heating[4]
Control system—Windows-based computer control[4]
Bond head size—150 mm[1]
Substrate sizes supported—100 mm wafers, 3 inch wafers, small pieces[1]
Compatible bonding processes—Adhesive, Anodic, Eutectic, Fusion, Glass frit, Thermal compression[1]
Wafer Size—6 inch (150 mm)[3]
Bonding Pressure Range—5e-5 to 3e-3 Torr[3]
Achievable Chamber Pressure—< 5x10^-5 mbar[1]
Supported Bonding Processes—Adhesive, Anodic, Eutectic, Fusion, Glass frit[1]

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Sources (4)Every fact above is drawn from these public sources
  1. [1]uwaterloo.cauwaterloo.ca
  2. [2]web.archive.orgweb.archive.org
  3. [3]inventory listing
  4. [4]nanolab.ucla.edunanolab.ucla.edu