Waferpedia

Comparison ledger

0041-39086 ESC PartversusUnaxis ICP

Applied Materials 0041-39086 ESC Part, Plasma-Therm Unaxis ICP, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0041-39086 ESC PartApplied Materials
Unaxis ICPPlasma-Therm
OEMApplied MaterialsPlasma-Therm
CategoryEtchEtch
Wafer size—Wafer auto load/unload
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
Family—Plasma-Therm Unaxis ICP
Specifications
Configuration—Gas Box:[1]
Gas 1—UFC 1660, Cl2, 100 sccm, +/- 3% accuracy[1]
Gas 2—MKS 1479, HBr, 100 sccm, +/- 3% accuracy[1]
Gas 3—MKS 1479, SF6, 100 sccm, +/- 3% accuracy[1]
Gas 4—UFC 8100, BCl3, 100 sccm 3%, +/- 3% accuracy[1]
Gas 5—MKS 1479, O2, 20 sccm 3%, +/- 3% accuracy[1]
Gas 6—MKS 1479, He, 20 sccm 3%, +/-3% accuracy[1]
Gas 7—UFC 1660, Ar, 100 sccm 3%, +/- 3% accuracy[1]
Gas 8—MKS 1479, N2, 20 sccm 3%, +/- 3% accuracy[1]
Wafer size—Wafer auto load/unload[1]
Temperature—Watlow 988 Chamber Chuck Temperature Control: (20-300°C) +/- 1°C[1]
Generator—ENI ACG 6 B[1]
Pressure Control Range—100 mTorr[1]
VAT Valve Control—PM 5[1]
Turbo Pump Limit Vacuum—5.0 E-6 Torr[1]

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Sources (1)Every fact above is drawn from these public sources
  1. [1]inventory listing