Comparison ledger
ASML TWINSCAN NXE:3100, SUSS MicroTec 150 e Mask, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 150 e MaskSUSS MicroTec | |
|---|---|---|
| OEM | ASML | SUSS MicroTec |
| Category | Lithography | Lithography |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | 2010 | — |
| Production run | — | — |
| Lifecycle | Pre-production | — |
| Lifecycle milestones | 2010 First shipment (pre-production) | — |
| Control system | — | — |
| Generation | — | — |
| Family | ASML TWINSCAN NXE:3100 | SUSS MicroTec 150 e Mask |
| Specifications | ||
| Status | Pre-production[1] | — |
| Light source wavelength | 13.5 nm (EUV)[1] | — |
| Numerical aperture (NA) | 0.33[1] | — |
| Resolution | 13 nm[1] | — |
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