ASML
Twinscan XT 1400 F alternatives
Comparable Lithography equipment documented in the Waferpedia catalog.
6 comparable tools
Nikon
NSR S 203 B
Lithography
The Nikon NSR S 203 B is a lithography system used for photolithography on 200 mm wafers.
Nikon
NSR S 204 B
Lithography
The Nikon NSR S 204 B is a scanner for 8-inch wafer photolithography. (Source 1: "Process: Photolithography", "Wafer Sizes: 8 inch")
Brooks
017-0024-01 Prealigner
Lithography
Brooks
017-0146-01 Prealigner
Lithography
Brooks 017-0146-01 is a prealigner manufactured by Brooks.
Ultratech
1000 Family
Lithography
EV Group
101
Lithography
The EVG 101 is an advanced resist processing system for spin or spray coating and developing of wafers up to 300 mm.
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