Comparison ledger
Axcelis 200 ACU, Oxford Instruments Plasmalab 80 Plus RIE-PECVD, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 200 ACUAxcelis | Plasmalab 80 Plus RIE-PECVDOxford Instruments |
|---|---|---|
| OEM | Axcelis | Oxford Instruments |
| Category | Etch | Etch |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Axcelis NV GSD 200 | Oxford Instruments Plasmalab 80 |
| Specifications | ||
| Configuration | Parts Machine[1] | It has some problems. It was setup with PC interface and it appears to have lost signals for RF power, pressure and chamber switch was erratic.[5] |
| Manufacturer | Axcelis[1] | — |
| Model | 200 ACU[1] | — |
| Tool type | Asher[1] | — |
| Wafer size | 200mm[3] | — |
| Serial number | AU6A356AH[3] | — |
| Computer system | M 200 PC, M 200[4] | — |
| Part number | SC 4572 A[4] | — |
| Volts | 208[4] | — |
| Amps | 30[4] | — |
| Equipment type | Asher[1] | — |
| Wafer configuration | 8 inch[2] | — |
| Dual Chamber (Chamber A | — | PECVD & Chamber B: RIE)[5] |
| Power Supply Upgrade | — | ENI Power Supply upgraded to MKS[5] |
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