Comparison ledger
Axcelis 200 ACU, Plasma-Therm SLR 770 RIE, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 200 ACUAxcelis | SLR 770 RIEPlasma-Therm |
|---|---|---|
| OEM | Axcelis | Plasma-Therm |
| Category | Etch | Etch |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Axcelis NV GSD 200 | Plasma-Therm SLR 770 |
| Specifications | ||
| Configuration | Parts Machine[1] | RF power supply has a water leak[5] |
| Manufacturer | Axcelis[1] | — |
| Model | 200 ACU[1] | — |
| Tool type | Asher[1] | — |
| Wafer size | 200mm[3] | — |
| Serial number | AU6A356AH[3] | — |
| Computer system | M 200 PC, M 200[4] | — |
| Part number | SC 4572 A[4] | — |
| Volts | 208[4] | — |
| Amps | 30[4] | — |
| Equipment type | Asher[1] | — |
| Wafer configuration | 8 inch[2] | — |
| Voltage | — | 208 V[5] |
| Frequency | — | 60 Hz[5] |
| Process capabilities per chamber | — | RIE or PE adjustable[6] |
| Top electrode gap | — | Adjustable[6] |
| Pumping | — | TMP turbo pumps[6] |
| Gas lines per chamber | — | 8 gas lines and MFCs[6] |
| Maximum wafer size | — | up to 8 inch wafers[7] |
| Electrical | — | 208 V - 60 Hz[5] |
| Vintage | — | 1994 Vintage[5] |
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