Waferpedia

Comparison ledger

FPA 2500 i 2versus101

Canon FPA 2500 i 2, EV Group 101, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
101EV Group
OEMCanonEV Group
CategoryLithographyLithography
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones1993 Vintage (6 inch unit) · 1994 Vintage (8 inch unit)—
Control system——
Generation——
FamilyCanon FPA 2500EV Group 101
Specifications
Missingchamber, cover[1]—
ManufacturerCanon[2]—
ModelFPA 2500 i 2[2]101[4]
TypeStepper[2]—
Wafer Size (6 inch)6 inch[2]—
Wafer Size (8 inch)8 inch[1]—
Vintage (6 inch unit)1993[2]—
Vintage (8 inch unit)1994[1]—
OEMCanon[1]EV Group[4]
Equipment typeStepper[2]—
Wafer size8 inch[1]—
Vintage1994[1]—
Serial number206106[3]—
Equipment name—EVG 101 Spray Coater[4]
NEMO ID—evgspraycoat[4]
Training required—EVG 101 Training[4]
Training duration—1.50 hours[4]
Processing technique—Resist Spray Coat (manual)[4]
Cleanliness—"All"[4]
Location—SNF Paul G Allen L107 Cleanroom[4]
Wafer diameter (substrate size)—up to 300 mm[5]
Available modules—Spin coat / OmniSpray® / develop[5]
Wafer handling options—Bowed / warped / thin wafer handling, edge handling[5]
Dispense options—Various resist dispense pumps covering viscosities up to 52000 cP; constant pressure dispense systems; EBR / BSR / pre-wet / bowl wash / liquid priming[5]
Processing technique (at SNF)—Resist Spray Coat (manual)[6]
Cleanliness group (at SNF)—"All"[4]

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Sources (6)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]Equipment inventory listing
  3. [3]f.machineryhost.comf.machineryhost.com
  4. [4]snfguide.stanford.edusnfguide.stanford.edu
  5. [5]evgroup.comevgroup.com
  6. [6]snfguide.stanford.edusnfguide.stanford.edu