Comparison ledger
Canon FPA 6000 ES 6 a KrF, SUSS MicroTec 150 e Mask, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | FPA 6000 ES 6 a KrFCanon | 150 e MaskSUSS MicroTec |
|---|---|---|
| OEM | Canon | SUSS MicroTec |
| Category | Lithography | Lithography |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Canon FPA 6000 | SUSS MicroTec 150 e Mask |
| Specifications | ||
| Configuration | 90nm[1] | — |
| Manufacturer | Canon[1] | — |
| Model | FPA 6000 ES 6 a[1] | — |
| Type | KrF Scanner[1] | — |
| Resolution / Node | 90nm[2] | — |
| Wafer Size | 12 inch (300mm)[2] | — |
| Laser Source | Cymer ELS-7310[2] | — |
| Reticle Size | 6 inch[2] | — |
| Reticle Configuration | Inline (R->L)[2] | — |
| Uniformity | 1.811%[2] | — |
| Intensity | 24299.68 W/m²[2] | — |
| Make | Canon[1] | — |
| Equipment type | KrF Scanner[1] | — |
| Process node | 90nm[2] | — |
| Wafer size | 12 inch[2] | — |
| Reticle | 6 inch reticle inline (R->L)[2] | — |
| Laser source | Cymer Laser (ELS-7310)[2] | — |
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