Comparison ledger
CEE 100 Spin, SVG 8626 Photoresist, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 100 SpinCEE | |
|---|---|---|
| OEM | CEE | SVG |
| Category | Resist Processing | Resist Processing |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | CEE 100 | SVG 8626 |
| Specifications | ||
| Configuration | Volts 115[1] | Cassette to cassette[2] |
| Wafer Size | — | 6 inch[2] |
| Number of Coats | — | 2 coat[2] |
| Pumps | — | Excluded[2] |
| Track Type | — | Dual track[3] |
| Hotplates | — | Included[3] |
| OEM | — | SVG[2] |
| Model | — | 8626[2] |
| Equipment type | — | Photo Resist Coaters[3] |
| Wafer sizes | — | 6 inch[2] |
| Coat count | — | 2 coat[2] |
| Description | — | Dual Track Photoresist Coater With Hotplates[3] |
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