Comparison ledger
CEE 100, SVG 661 HT, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 100CEE | 661 HTSVG |
|---|---|---|
| OEM | CEE | SVG |
| Category | Lithography | Lithography |
| Wafer size | 6" | Mask / Wafer Handling: |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | CEE 100 | SVG 661 HT |
| Cited variants |
| — |
| Specifications | ||
| Tool type | Spray Developer[1] | — |
| Accepts wafer size | up to 6" wafers[2] | — |
| Programmable programs | 10 programs[2] | — |
| Steps per program | up to 10 steps[2] | — |
| Programmable step parameters | Acceleration, Speed, Time[2] | — |
| Associated document | CEE Model 100CB Spinner.doc[2] | — |
| Wafer size | Up to 6 inches[2] | Mask / Wafer Handling:[3] |
| Programs | 10 programs each with up to 10 steps[2] | — |
| Control parameters | Acceleration, Speed, Time[2] | — |
| Configuration | — | Refurbished in 2022[3] |
| Process | — | Photo Exposure[3] |
| Heat Exchanger / Chiller | — | Blower[3] |
| OEM | — | SVG[3] |
| Model | — | 661 HT[3] |
| Equipment type | — | Aligner[3] |
| Category | — | Lithography[4] |
| Optics | — | High Throughput Coated Optics (HT)[3] |
| Performance | — | Integrated Uniformity Tester[3] |
| Software | — | OS 2000 Hardware and Software v29.x or Higher[3] |
| Host link | — | SEMI-GEM E 30 & HSMS # 37 Compliant Host Link[3] |
| Chamber Type | — | M 500 / 600[3] |
| Cassette Stage | — | 150 mm no smf[3] |
| Wafer Mapping | — | Optical Sensor[3] |
| Control System | — | OS 2000[3] |
| Air Cooler | — | 39,000 BTU 220 Vac 3 Ф[3] |
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