Waferpedia

Comparison ledger

1000 Hot Plateversus6-2P-CP

CEE 1000 Hot Plate, YES 6-2P-CP, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
OEMCEEYES
CategoryThermal / DiffusionThermal / Diffusion
Wafer size—150mm
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyCEE 1000 Hot PlateYES 6-2P-CP
Cited variants—
Specifications
Configuration4"[2]—
TypeHot Plate[2]—
Wafer Size4 inch[2]—
Series—PB Series (manual load)[3]
Model—6-2P-CP[1]
Wafer size—150 mm wafers[1]
Process type—high temperature cure oven[3]
Operation—manual load[3]
Atmosphere/process control—dry inert atmosphere, pressure control, uniform temperature distribution, control of heating and cooling rates[3]
Cooling package—air only, no water[3]
Airflow—vertical laminar airflow[3]

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Sources (3)Every fact above is drawn from these public sources
  1. [1]web.archive.orgweb.archive.org
  2. [2]inventory listing
  3. [3]web.archive.orgweb.archive.org