Waferpedia

Comparison ledger

200 Bake Plateversus200 Spin

CEE 200 Bake Plate, CEE 200 Spin, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
OEMCEECEE
CategoryThermal / Diffusion—
Wafer size200mm—
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyCEE 200CEE 200
Specifications
Wafer sizeup to 200mm wafer[1]—
SoftwareInternal OS[1]—
Voltage208V[1]—
Wafer Sizeup to 200 mm[2]—
Maximum Temperature300 °C[2]—
Bake MethodsHard contact, Proximity (lift 25-100 μm using N2)[2]—
Exhaust CoverYes (removal of fume)[2]—
Smart Pins for Temperature ControlYes[2]—
Phase—1 Phase[3]

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Sources (3)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]aggiefab.tamu.eduaggiefab.tamu.edu
  3. [3]inventory listing