Waferpedia

Comparison ledger

101versusEVG 40 NT

EV Group 101, EV Group EVG 40 NT, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
101EV Group
EVG 40 NTEV Group
OEMEV GroupEV Group
CategoryLithographyLithography
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyEV Group 101—
Specifications
OEMEV Group[1]—
Model101[1]EVG 40 NT[4]
Equipment nameEVG 101 Spray Coater[1]—
NEMO IDevgspraycoat[1]—
Training requiredEVG 101 Training[1]—
Training duration1.50 hours[1]—
Processing techniqueResist Spray Coat (manual)[1]—
Cleanliness"All"[1]—
LocationSNF Paul G Allen L107 Cleanroom[1]—
Wafer diameter (substrate size)up to 300 mm[2]—
Available modulesSpin coat / OmniSpray® / develop[2]—
Wafer handling optionsBowed / warped / thin wafer handling, edge handling[2]—
Dispense optionsVarious resist dispense pumps covering viscosities up to 52000 cP; constant pressure dispense systems; EBR / BSR / pre-wet / bowl wash / liquid priming[2]—
Processing technique (at SNF)Resist Spray Coat (manual)[3]—
Cleanliness group (at SNF)"All"[1]—
Manufacturer—EV Group[4]
Product type—Aligner[4]
Vintage—2011[4]
Measurement scope—Lithography-relevant parameters and bond alignment accuracy[5]
Measurement methods—Critical dimension measurement, die-to-die alignment verification, multi-layer thickness measurement[5]
Tool format—Stand-alone tool[5]
Integrated module—AVM (HVM-integrated module)[5]
Application examples—Nanoimprint lithography and wafer-to-wafer bonding[5]
Verification capability—100 nm bond overlay accuracy of EVG's GEMINI FB automated fusion bonding system[5]

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Sources (5)Every fact above is drawn from these public sources
  1. [1]snfguide.stanford.edusnfguide.stanford.edu
  2. [2]evgroup.comevgroup.com
  3. [3]snfguide.stanford.edusnfguide.stanford.edu
  4. [4]Equipment inventory listing
  5. [5]evgroup.comevgroup.com