EV Group
620 Mask alternatives
Comparable Lithography equipment documented in the Waferpedia catalog.
6 comparable tools
KLA
ICOS CI 8 X 50 Lead
Lithography
KLA ICOS CI 8 X 50 Lead is a lead scanner described with 3.4 kW power and related operating requirements.
Quintel
Q 7000 Mask
Lithography
Brooks
017-0024-01 Prealigner
Lithography
Brooks
017-0146-01 Prealigner
Lithography
Brooks 017-0146-01 is a prealigner manufactured by Brooks.
CEE
100
6"
Lithography
The CEE 100 is a lithography spin coater/developer tool that accepts up to 6-inch wafers and supports programmable multi-step processing.
Ultratech
1000 Family
Lithography
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