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Comparison ledger

R50versusP-2

Filmetrics R50, KLA P-2, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
R50Filmetrics
P-2KLA
OEMFilmetricsKLA
CategoryMetrology & InspectionMetrology & Inspection
Wafer size200mm200mm
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyFilmetrics R50KLA P-2
Specifications
Default configurationconfigured by default for metallic layers[1]—
Default sample thickness525 um +/- 25 um[1]—
Equipment sectionMetrology[1]—
Related equipment on same page groupAIT CMT-SR2000N 4-Point Probe Measurement System; MPI TS150 Probe Station[1]—
Measurement type4-point probe[1]—
Default materialmetallic layers[1]—
Model—P-2[2]
OEM—KLA Tencor[2]
Equipment type—Profilometer[2]
Sample table—200 mm sample table with vacuum[3]
Measurement range—Measures steps from 100 Å to 300 µm[3]
Maximum sample thickness—20 mm[3]
Minimum sample length—25 mm[3]
Feature—3D scan option[3]
Wafer size—200mm[4]
3D scan option—Yes[3]

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Sources (4)Every fact above is drawn from these public sources
  1. [1]epfl.chepfl.ch
  2. [2]nanofab.ece.cmu.edunanofab.ece.cmu.edu
  3. [3]nanofab.ece.cmu.edunanofab.ece.cmu.edu
  4. [4]waferpedia.comwaferpedia.com