Comparison ledger
Headway 1 EC 101 R 485 Photoresist Spinner, Tokyo Electron Act 8, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | Act 8Tokyo Electron | |
|---|---|---|
| OEM | Headway | Tokyo Electron |
| Category | Resist Processing | Resist Processing |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Headway 1 EC 101 R 485 Photoresist Spinner | Tokyo Electron Act |
| Cited variants | — |
|
| Specifications | ||
| Vacuum requirement | 23" Hg[4] | — |
| Electrical | 115 V, 3 A, 50/60 Hz, 1 Ø (single phase)[4] | — |
| Electrical power | 115 V, 3 A, 50/60 Hz, 1 Ø (single phase)[4] | — |
| Configuration | — | Dual Block, 4 Load Port/1 Side Port[1] |
| Vintage | — | 2006 |
| Coaters & Developers Vintage | — | 1999 |
| Wafer Size | — | 8 inch[7] |
Plan your fab
Building a Resist Processing process? Get a complete equipment list.
Open the fab equipment planner →