Waferpedia

Comparison ledger

1305 BSG 3versusClean Track Act 12 Resist

Hitachi 1305 BSG 3, Tokyo Electron Clean Track Act 12 Resist, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
1305 BSG 3Hitachi
OEMHitachiTokyo Electron
CategoryWet Processing / CleanWet Processing / Clean
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyHitachi 1305 BSG 3Tokyo Electron Clean Track
Cited variants—
  • 12" Single Block[1]
  • 12" Multi Block[2]
  • Clean Track Act 12 Single Block[1]
  • Clean Track Act 12 Multi Block[2]
Specifications
Configuration—Single Block[1]
Make—Tel[1]
Model—Clean Track Act 12[1]
Wafer Sizes—12 inch[1]
Configuration (Single Block or Multi Block)—Single Block / Multi Block[1]
Equipment type—Resist coater / developer[1]
Wafer size—12 inch[1]
Block configuration—Single block[1]

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Sources (2)Every fact above is drawn from these public sources
  1. [1]Equipment inventory listing
  2. [2]Equipment inventory listing