Comparison ledger
KLA .496 PSL Wafer, Thermo Fisher Scientific FEI Nova NanoSEM 450, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | Scientific FEI Nova NanoSEM 450Thermo Fisher | |
|---|---|---|
| OEM | KLA | Thermo Fisher |
| Category | Metrology & Inspection | Metrology & Inspection |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | KLA .496 PSL Wafer | Thermo Fisher Scientific FEI Nova NanoSEM |
| Specifications | ||
| Configuration | NIST Traceable[1] | 1-30 kV (500 volts possible); 50 volts possible using beam deceleration[3] |
| Wafer size | 8 inch[1] | — |
| Traceability | NIST Traceable[1] | — |
| Compatible systems | Capable on Surfscan 6xy0 and SP1[1] | — |
| Category | Metrology & Inspection[2] | — |
| Tilt | — | -15 to 54 degrees[3] |
| Z-range | — | 0-25 mm[3] |
| Accelerating voltage | — | 1-30 kV; 500 volts possible; 50 volts possible using beam deceleration[3] |
| Immersion lens | — | Present[3] |
| Navigation camera | — | NavCam and infrared CCD camera[3] |
| Plasma cleaner | — | Present[3] |
| Cold finger | — | Present (for improved vacuum levels)[3] |
| Sample loader | — | Quick Loader with accompanying sample sledges[3] |
| User interface | — | Manual User Interface (knob set), no joystick[3] |
| Stage navigation range | — | 110 mm x 110 mm[3] |
| Tilt range | — | -15 to 54 degrees[3] |
| Eucentric position | — | Present, working distance at 5 mm[3] |
| Control software | — | xT microscope Control Software, running on Windows XP[3] |
| Pumps | — | Edwards nXDS10i scroll pump and turbomolecular pump[3] |
| Chiller | — | Haskris water chiller[3] |
| Detectors | — | Everhart-Thornley detector, through-lens detector, retractable concentric backscatter detector, low-vacuum helix detector, special low vacuum detector[3] |
| Beam deceleration | — | Present[3] |
| External fast beam blanker | — | Compatible with electron-beam lithography attachments[3] |
| Vintage | — | 2012[3] |
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