Comparison ledger
Lam Research Rainbow 4528 I, Oxford Instruments 100 ICP Fluorine, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | Rainbow 4528 ILam Research | 100 ICP FluorineOxford Instruments |
|---|---|---|
| OEM | Lam Research | Oxford Instruments |
| Category | Etch | Etch |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Lam Research Rainbow | Oxford Instruments 100 ICP Fluorine |
| Specifications | ||
| Software | Envision 1.5.2[1] | — |
| RF | Paramount 1213 / Paramount MF 3KW[1] | — |
| Configuration | RF Cart[1] | — |
| AC Box | 002 (breakers)[1] | — |
| Robot | Harmonic Drive[1] | — |
| Loader | Hine Indexers 38A[1] | — |
| Controllers | AC2G controller ISO THV / AC2 main chamber THV[1] | — |
| GAS 1 | Ar: 500 sccm[1] | — |
| GAS 2 | CF4: 200 sccm[1] | — |
| GAS 3 | CHF3: 100 sccm[1] | — |
| GAS 4 | SF6: 100 sccm[1] | — |
| GAS 5 | N2: 100 sccm[1] | — |
| GAS 6 | O2: 100 sccm[1] | — |
| GAS 7 | He: 1000 sccm[1] | — |
| GAS 8 | NF3: 1000 sccm[1] | — |
| GAS 10 | O2: 100 sccm[1] | — |
| Type | Plasma etcher[1] | — |
| Wafer size | 8 inch[1] | 4 inch, 6 inch, 8 inch (with clamp change)[2] |
| RF cart | RF Cart[1] | — |
| AC Rack | on mezzanine[1] | — |
| Etch Gases | — | SF6, CF4, O2, Ar, N2, CHF3, C4F8[2] |
| Cryo DRIE etch rate | — | up to 5 µm/min[2] |
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