Waferpedia

Comparison ledger

Rainbow 4720versus100 ICP Fluorine

Lam Research Rainbow 4720, Oxford Instruments 100 ICP Fluorine, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
Rainbow 4720Lam Research
100 ICP FluorineOxford Instruments
OEMLam ResearchOxford Instruments
CategoryEtchEtch
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyLam Research Rainbow 4720Oxford Instruments 100 ICP Fluorine
Cited variants
  • Rainbow 4720 Dry[1]
  • Rainbow 4720 Metal Etch[2]
—
Specifications
Wafer Size8 inch (200mm)[3]—
Etch Gases—SF6, CF4, O2, Ar, N2, CHF3, C4F8[4]
Cryo DRIE etch rate—up to 5 µm/min[4]
Wafer size—4 inch, 6 inch, 8 inch (with clamp change)[4]

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Sources (4)Every fact above is drawn from these public sources
  1. [1]waferpedia.comwaferpedia.com
  2. [2]semistarcorp.comsemistarcorp.com
  3. [3]Equipment inventory listing
  4. [4]nanofab.utah.edunanofab.utah.edu