Waferpedia

Comparison ledger

05 LHP 151versusMetaPulse 200 XCu Metal Film Measurement

Melles Griot 05 LHP 151, Onto Innovation MetaPulse 200 XCu Metal Film Measurement, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
05 LHP 151Melles Griot
OEMMelles GriotOnto Innovation
CategoryPrecision OpticsPrecision Optics
Wafer size—Wafer Mapping
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyMelles Griot 05Onto Innovation MetaPulse 200
Specifications
ConfigurationWith 05 LPL 340 Power Supply (Does not power on)[1]Non copper tool; double path tool delay stage[3]
Equipment typeLaser[1]—
MakeMelles Griot[1]—
Model05 LHP 151[1]—
Power stateDoes not power on[1]—
Cooling Water Required Minimum Flow—0.79 GPM (3.00 l/m)[3]
Min Temp—12 *C (54 *F, 285.00 *K)[3]
Max Temp—20 *C (68 *F, 293 *K)[3]
Wafer size—Wafer Mapping[3]
Controller Type—PC Controller[3]
External Cooling—Water Cooled[3]
Cooling Water Required—Minimum Flow: 0.79 GPM (3.00 l/m) Min Temp: 12 *C (54 *F, 285.00 *K) Max Temp: 20 *C (68 *F, 293 *K)[3]
Operating Air Pressure—14.00 PSI (96,534.20 N/sq m)[3]
Vacuum Required—0.98 in Hg (24.89 mm Hg)[3]

Plan your fab

Building a Precision Optics process? Get a complete equipment list.

Open the fab equipment planner →
Sources (4)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]waferpedia.comwaferpedia.com
  3. [3]inventory listing
  4. [4]inventory listing