Waferpedia

Comparison ledger

1505 G 6 EversusNSR 2205 iL 1 i-Line

Nikon 1505 G 6 E, Nikon NSR 2205 iL 1 i-Line, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
OEMNikonNikon
CategoryLithographyLithography
Wafer size——
Process node——
Introduced——
Production run1988–—
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyNikon 1505Nikon NSR 2205 iL 1 i-Line
Specifications
Configuration5" reticle[1]—
Resolution650 nm[2]—
Numerical Aperture0.54[2]—
Reduction5x[2]—
Exposure Field15 x 15 mm[2]—
Alignment Accuracy130 nm[2]—
Wafer Size4 inch[1]—
Light Sourceg-line[3]—
Introduction Year1988[2]—
NA (Numerical Aperture)0.54[2]—
MakeNikon[1]—
Model1505 G 6 E[1]—
CategoryStepper[1]—
Wafer Sizes4 inch[1]—
Exposure typeg-line[2]—
NA0.54[2]—
Exposure field9.3 x 18.8 mm[2]—
Light source—i-line[4]
Vintage—2023[4]

Plan your fab

Building a Lithography process? Get a complete equipment list.

Open the fab equipment planner →
Sources (4)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]web.archive.orgweb.archive.org
  3. [3]ece.utoronto.caece.utoronto.ca
  4. [4]Equipment inventory listing