Nikon
NSR 2005 i 12 i-Line alternatives
Comparable Lithography equipment documented in the Waferpedia catalog.
6 comparable tools
Nikon
NSR 2005 i 11 D i-Line
Wafer Loader
Lithography
The Nikon NSR 2005 i 11 D i-Line is a lithography stepper with i-line illumination.
Brooks
017-0024-01 Prealigner
Lithography
Brooks
017-0146-01 Prealigner
Lithography
Brooks 017-0146-01 is a prealigner manufactured by Brooks.
CEE
100
6"
Lithography
The CEE 100 is a lithography spin coater/developer tool that accepts up to 6-inch wafers and supports programmable multi-step processing.
Ultratech
1000 Family
Lithography
EV Group
101
Lithography
The EVG 101 is an advanced resist processing system for spin or spray coating and developing of wafers up to 300 mm.
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