Waferpedia

Comparison ledger

Exceed 3000 AHversus160 XP Ion

Nissin Exceed 3000 AH, Varian 160 XP Ion, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
OEMNissinVarian
CategoryIon ImplantationIon Implantation
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyNissin Exceed 3000 AHVarian 160 XP Ion
Cited variants
  • EXCEED3000AH-8C[1]
—
Specifications
ConfigurationMedium current[2]150mm High Current IMP[5]
Typemedium current ion implanter[3]—
Wafer size6-inch wafers[3]—
Process modenanometer-scale process modes[4]—
Transport systemhandles thin wafers and other various substrates[4]—
Average autotune timeless than 2 minutes[4]—
Beam angle feedbackhorizontal and vertical beam angle feedback system with multiple Faraday cup system[4]—
OEM—Varian[6]
Model—160 XP Ion[6]
Category—Ion Implantation[5]
Tool type—ion implanter[5]

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Sources (6)Every fact above is drawn from these public sources
  1. [1]nccavs-usergroups.avs.orgnccavs-usergroups.avs.org
  2. [2]inventory listing
  3. [3]waferpedia.comwaferpedia.com
  4. [4]nissin-ion.co.jpnissin-ion.co.jp
  5. [5]waferpedia.comwaferpedia.com
  6. [6]Equipment inventory listing