Comparison ledger
Oxford Instruments 100 ICP Fluorine, Semitool Equinox, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 100 ICP FluorineOxford Instruments | EquinoxSemitool |
|---|---|---|
| OEM | Oxford Instruments | Semitool |
| Category | Etch | Etch |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Oxford Instruments 100 ICP Fluorine | Semitool Equinox |
| Specifications | ||
| Etch Gases | SF6, CF4, O2, Ar, N2, CHF3, C4F8[1] | — |
| Cryo DRIE etch rate | up to 5 µm/min[1] | — |
| Wafer size | 4 inch, 6 inch, 8 inch (with clamp change)[1] | — |
| Configuration | — | 4 chamber capacity[2] |
| Make | — | Semitool[2] |
| Model | — | Equinox[2] |
| Wafer Sizes | — | 6 inch[2] |
| Tool type | — | Wet Etch System[3] |
| Process | — | Acid Etch[3] |
| Upgrade | — | Auto drain upgrade[2] |
Plan your fab
Building a Etch process? Get a complete equipment list.
Open the fab equipment planner →