Comparison ledger
Raith EBPG5150, SUSS MicroTec 150 e Mask, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | EBPG5150Raith | 150 e MaskSUSS MicroTec |
|---|---|---|
| OEM | Raith | SUSS MicroTec |
| Category | Lithography | Lithography |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Raith EBPG5150 | SUSS MicroTec 150 e Mask |
| Cited variants | — | |
| Specifications | ||
| product family | Electron Beam Lithography[2] | — |
| system line | EBPG[1] | — |
| description | Highest throughput, automation, and precision[1] | — |
| column technology | Robust 100 kV column technology[1] | — |
| lithography resolution | below 5 nm[1] | — |
| exposure capability | Automated wafer and multi-sample exposures[1] | — |
| beam current | up to 350 nA[1] | — |
| overlay accuracy | ≤ 5 nm[1] | — |
| stitching accuracy | ≤ 8 nm[1] | — |
| stage size | same 6-inch laser stage (155 mm travel range)[1] | — |
| laser interferometer resolution | 10 λ/1024 (0.6 nm) standard[1] | — |
| thermo-calibration system | standard[1] | — |
| positional drift | < 25 nm / h[1] | — |
| control software | Digital RAITH Beams[1] | — |
| Product line | EBPG[2] | — |
| Technology | Electron beam lithography[2] | — |
| Stage | 6-inch laser stage[1] | — |
| Stage travel range | 155 mm[1] | — |
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