Comparison ledger
STS Multiplex ICP Advanced Oxide, Tegal 1512e, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 1512eTegal | |
|---|---|---|
| OEM | STS | Tegal |
| Category | Etch | Etch |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | STS Multiplex ICP | Tegal 1512e |
| Specifications | ||
| Voltage | 208 V[1] | — |
| Configuration | 80 A[1] | — |
| Frequency | 60 Hz[1] | — |
| RF Generators | ENI ACG10B 1kW (13.56MHz)[1] | — |
| Clamp Type | Standard WTC[1] | — |
| Platen Type | Domed[1] | — |
| Turbo Pump | None[1] | — |
| MACs Robot | None[1] | — |
| Pumping System | None[1] | — |
| Tool type | — | Industrial RIE plasma etcher system[2] |
| Stated configuration | — | With modules assembly for CI-4222[2] |
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