Waferpedia

Comparison ledger

Clean Track Lithius Resistversus1000FP

Tokyo Electron Clean Track Lithius Resist, YES 1000FP, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
OEMTokyo ElectronYES
CategoryWet Processing / CleanWet Processing / Clean
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyTokyo Electron Clean TrackYES 1000FP
Cited variants
  • Clean Track Lithius Resist Coater / Developer — 12" Single Block[1]
  • Clean Track Lithius Resist Coater / Developer — 12" Single[2]
  • Clean Track Lithius Resist Coater / Developer — 12" Multi[3]
—
Specifications
ConfigurationSingle Block[1]—
MakeTel[1]—
ModelClean Track Lithius[1]Glen/YES 1000FP[4]
Wafer size12 inch[1]—
Product typeResist Coater / Developer[1]—
OEMTokyo Electron[1]—
Equipment typeResist Coater / Developer[1]—
System type—Plasma cleaning system[4]
Line—R-Series Plasma Cleaning Systems (Glen Technologies)[4]
Designed use—Designed to accept a range of shelf sizes[4]
Application focus—Changing needs of the flat panel industry[4]

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Sources (4)Every fact above is drawn from these public sources
  1. [1]Equipment inventory listing
  2. [2]Equipment inventory listing
  3. [3]Equipment inventory listing
  4. [4]web.archive.orgweb.archive.org