Waferpedia

Comparison ledger

160 XPversusEHP 500 Ion

Varian 160 XP, Varian EHP 500 Ion, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
160 XPVarian
OEMVarianVarian
CategoryIon ImplantationIon Implantation
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyVarian 160 XPVarian EHP 500 Ion
Cited variants—
Specifications
Configuration (160 XP Ion variant)150mm High Current IMP[1]—
Software version—13.42.18[2]
CIM—GEM and SECS[2]
Handler—End station PP+ with both Load Lock[2]
Configuration—SMIF[2]
Wafer size—8 inch[2]
Handler / End station—End station PP+ with both Load Lock[2]
SMIF—Included[2]
Scrubber Exhaust—Included[2]
2 Stage Rough Pump—Included[2]
Load Lock Rough Pump—Included[2]
Vintage year—1998[2]

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Sources (2)Every fact above is drawn from these public sources
  1. [1]waferpedia.comwaferpedia.com
  2. [2]inventory listing