Comparison ledger
Zeiss NVision 40, Zeiss NVision 40 X-Beam, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | NVision 40Zeiss | NVision 40 X-BeamZeiss |
|---|---|---|
| OEM | Zeiss | Zeiss |
| Category | — | Test & Probe |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Zeiss NVision 40 | Zeiss NVision 40 |
| Specifications | ||
| Configuration | 208-230 V[1] | Kleindiek mm3a micromanipulator included[6] |
| Manufacturer | Zeiss[1] | — |
| Model | NVision 40[1] | — |
| Electron microscope type | SEM-FIB[2] | — |
| SEM column | Schottky field emission Gemini column[3] | — |
| SEM operating voltage | 100 V to 30 kV[3] | — |
| SEM resolution | 1.1 nm at 20 kV; 2.5 nm at 1 kV[3] | — |
| FIB column | SIINT Zeta Ga+ ion FIB column[3] | — |
| FIB operating voltage | 1 kV to 30 kV[3] | — |
| FIB ion current | 0.1 pA to 45 nA[3] | — |
| Ion beam resolution | 4 nm at 1 pA[3] | — |
| Power | 208-230 V[1] | — |
| Frequency | 50-60 Hz[1] | — |
| Gas delivery | Has W, C SiO2 and H20 gases installed[4] | — |
| Micromanipulator | With kleindiek mm3a micromanipulator[1] | Kleindiek mm3a[6] |
| XeF2 | Option, not installed[1] | — |
| Controller status | One of the controllers on the two turbo pumps is not operational[4] | — |
| Detectors | Everhart-Thornley detector, 4 quadrant backscatter, in-lens secondary electron detector, energy selective backscatter detector[3] | — |
| Lithography system | Raith Elphy Quantum lithography system[3] | — |
| Nanoscale lithography | NanoPattern Generating System (NPGS)[5] | — |
| Gas Injectors Installed | — | W, C SiO2, H2O (Xe F2 Optional / not installed)[6] |
| Installed gas injectors | — | Tungsten (W), Carbon (C), Silicon Dioxide (SiO2), Water (H2O)[6] |