Waferpedia

Comparison ledger

RFG 1250 Haloversus0010-03485 Magnet Assy

Advanced Energy RFG 1250 Halo, Applied Materials 0010-03485 Magnet Assy, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
RFG 1250 HaloAdvanced Energy
0010-03485 Magnet AssyApplied Materials
OEMAdvanced EnergyApplied Materials
Category——
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyAdvanced Energy RFGApplied Materials 0010-03485 Magnet Assy
Specifications
ConfigurationRefurbished[1]WP AL 300mm PVD[5]
ManufacturerAdvanced Energy[2]Applied Materials[5]
ModelRFG 1250 Halo[2]0010-03485[5]
Model number3155027-028[3]—
Output powerup to 1200W / 1.2kW[3]—
Frequency modefixed frequency or variable frequency[3]—
Used onLAM Etchers among others[4]—
OEM—Applied Materials[5]
Description—MAGNET ASSY, WP AL 300MM PVD[6]
Process—PVD[7]
Wafer size—300mm[8]
Version—Spares[8]
Part Number—0010-03485[5]
Process Type—PVD (Physical Vapor Deposition)[5]
Application (Material)—Aluminum (AL)[5]
Wafer Diameter (associated)—300 mm[5]
Sources (8)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]Equipment inventory listing
  3. [3]palrepair.compalrepair.com
  4. [4]semistarcorp.comsemistarcorp.com
  5. [5]inventory listing
  6. [6]semistarcorp.comsemistarcorp.com
  7. [7]layla-ec.comlayla-ec.com
  8. [8]fabsurplus.comfabsurplus.com