Comparison ledger
Applied Materials 0010-03485 Magnet Assy, Onto Innovation Nanospec 6100, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-03485 Magnet AssyApplied Materials | Nanospec 6100Onto Innovation |
|---|---|---|
| OEM | Applied Materials | Onto Innovation |
| Category | — | — |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-03485 Magnet Assy | Onto Innovation Nanospec 6100 |
| Cited variants | — |
|
| Specifications | ||
| Configuration | WP AL 300mm PVD[2] | — |
| OEM | Applied Materials[2] | — |
| Model | 0010-03485[2] | — |
| Description | MAGNET ASSY, WP AL 300MM PVD[3] | — |
| Process | PVD[4] | — |
| Wafer size | 300mm[5] | — |
| Version | Spares[5] | — |
| Part Number | 0010-03485[2] | — |
| Manufacturer | Applied Materials[2] | — |
| Process Type | PVD (Physical Vapor Deposition)[2] | — |
| Application (Material) | Aluminum (AL)[2] | — |
| Wafer Diameter (associated) | 300 mm[2] | — |
| Measurement Range | — | 25 – 200,000 Å (0.0025 – 20 micrometers)[1] |
| Optional UV Measurement Range | — | 25 Å – 500 Å[1] |
| Spectral Range | — | 210 – 800 nm (continuous scanning)[1] |
| Standard Objective Lenses | — | 4X, 10X, 40X[1] |
| Optional UV Objective Lens | — | 15X reflecting UV objective[1] |
| Wafer Size Compatibility | — | 100mm/150mm or 150mm/200mm[1] |
| Operating System | — | Windows 95[1] |
| Microprocessor | — | 32-bit Pentium[1] |
| Light Source (Standard) | — | Regulated tungsten halogen lamp[1] |
| Light Source (Optional UV) | — | Deuterium UV source[1] |
| Focusing | — | Automated focusing[1] |